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Wednesday, July 29, 2020 | History

3 edition of Negative ions and the magnetron found in the catalog.

Negative ions and the magnetron

Francis Michael Page

Negative ions and the magnetron

by Francis Michael Page

  • 70 Want to read
  • 26 Currently reading

Published by Wiley-Interscience in Chichester .
Written in English

  • Valence (Theoretical chemistry)

  • Edition Notes

    Statementby F.M. Page, G.C. Goode.
    ContributionsGoode, G. C.
    The Physical Object
    Paginationxiii,156p. :
    Number of Pages156
    ID Numbers
    Open LibraryOL21469446M
    ISBN 100471657530

    The sputtering of YBa/sub 2/Cu/sub 3/O/sub x/ in both RF diode and magnetron systems has been plagued by negative ions effects. Negative ions are produced at the cathode surface during sputtering and are accelerated across the plasma sheath into the plasma. The dominant negative ion produced is O/sup -/. The negative ion attains energy by.   The magnetron cathodes are roughly classified into an equilibrium state and an unbalanced magnetron cathode according to the distribution of the magnetic field configuration. Cooling is necessary for all sources (magnetron, multiarc, ion) because a .

    Electrons with negative charge, and being more mobile than ions, are hitting the target more often, and creating a self bias. Kindly refer to some good books which explain this in detail. K. Sreenivas. A significant improvement in the performance of the BNL Mark III magnetron negative ion sources has been achieved by putting cylindrical grooves on the cathode to geometrically focus surface produced H - and D - ions into the emission slit in the anode. The addition of these grooves has allowed us to reach desired negative ion emission current densities with an order of magnitude lower arc.

      Background. Psychological effects of air ions have been reported for more than 80 years in the media and scientific literature. This study summarizes a qualitative literature review and quantitative meta-analysis, where applicable, that examines the potential effects of exposure to negative and positive air ions on psychological measures of mood and emotional state. Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the film resistivity over the deposition area.

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Additional Physical Format: Online version: Page, F.M. Negative ions and the magnetron. London, New York, Wiley-Interscience, (OCoLC) Buy Negative ions and the magnetron on FREE SHIPPING on qualified orders Negative ions and the magnetron: F.

Page, G. Goode: : Books Cited by:   The Importance of Negative Ions on physical and mental well-being - Hospital burn victims have been treated successfully with negative ions.

- People living near natural water falls, a highly concentrated negative ion environment, live healthier and longer lives. - Asthma and allergies are alleviated even cured in atmospheres rich in negative ions.4/4(11). Magnetron and Penning ion sources have a long history going back to the early part of the 20 th century.

Their use for negative ion production off in s Soviet Russia wreally tookith the introduction of ted m agnetron and Penning negative ion sources are to Cited by: 4. Magnetron and Penning ion sources have a long history going back to the early part of the 20 th century. Their use for negative ion production off in s Soviet Russia with the really took introduction of ted magnetron and Penning negative ion sources are.

But it becomes a negative ion if an extra electron is pushed into the atom so that it has an excessive number of electrons. Negative ions vs. positive ions. Positive ions are known as cations. Magnetron sputtering coating is a vacuum coating process that falls under the category of physical vapor deposition (PVD) and is mainly used for depositing metals, alloys, and compound textiles, and other material with a Negative ions and the magnetron book up to 5μ.

In textile coatings, it is used to coat textile fabrics with metals to provide antimicrobial, antistatic, and electroconductive properties.

negative ions in pulsed reactive magnetron plasmas (Ar/O 2) and their effect on the structure and dynamics of the plasma itself. The main negative ion species we observe close to the substrate is O-with densities approaching the electron density in the pulse on time, but with.

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics.

Ionization of sputtered atoms is. methods, where high-energy ions strike a solid and knock off atoms from the surface. Ionic sputtering techniques include diode sputtering, ion-beam sput- tering and magnetron sputtering. We are specifically concerned here with cathodic sputtering techniques where the ions are derived from a plasma in a low-pressure gas between two electrodes.

Negative ion density measurements in a reactive dc magnetron using the eclipse photodetachment method R Dodd, S-D You, P M Bryant et al.-A study of the plasma electronegativity in an argon oxygen pulsed-dc sputter magnetron S D You, R Dodd, A Edwards et al.-The behaviour of negative oxygen ions in the afterglow of a reactive HiPIMS discharge.

The fundamental difference between the magnetron and Penning sources is that in the magnetron, H-ions produced at the cathode are directly extracted, while in the Penning source, the cathode has no line of sight and so ions must undergo a charge-exchange.

The negative ion flux during reactive sputtering from planar and rotating cylindrical magnetrons has been studied. Energy resolved mass spectrometry was used to measure the energy and mass distribution of the negative ions. Also the angular distribution of the high energy ions was characterized for planar as well as for rotating cylindrical magnetrons.

Formation of singly and doubly charged Ar q+ and Ti q+ (q = 1,2) and of molecular Ar, ArTi +, and Ti ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry.

Measured ion energy distributions consist of low-energy and high-energy components resembling different formation. So, the negative oxygen ions formed as well as Ar ion bombardment of the growing HA film caused its stoichiometric deviation from the target composition.

So, the RF‐magnetron sputtering is well‐suited method to prepare coatings with different Ca/P molar ratios by variation of the substrate temperature, substrate bias, and position of the. @article{osti_, title = {Negative ion effects during magnetron and ion beam sputtering of YBa/sub 2/Cu/sub 3/O/sub x/}, author = {Rossnagel, S M and Cuomo, J J}, abstractNote = {The sputtering of YBa/sub 2/Cu/sub 3/O/sub x/ in both RF diode and magnetron systems has been plagued by negative ions effects.

Negative ions are produced at the cathode surface during sputtering and. Keywords: DC, RF magnetron, laser photo-detachment, negative ions, reactive sputtering, Langmuir probe 1. Introduction Reactive magnetron sputtering, is well established in industry and research to deposit engineering quality thin films and coatings [1] for instance, the addition of oxygen into a magnetron sputtering system can allow the high.

A negative ion source is disclosed which includes an electrode, a target having a more negative electrical potential than the electrode, a supply of electrical energy for generating a discharge between the electrode and the target, and at least one magnet positioned so as to confine electrons, generated as a result of said discharge, in close proximity to a first surface of the target.

In this article, I'll show you how to build a simplistic circuit to generate negative ions. Negative ions have been known to contribute to fresher air, happier mood, and general health benefits. However, they also look amazing in the dark (check out the photos below, purple plasma is amazing!).

And if all else fails, they make a cool nightlight. If you've ever been around a Tesla coil, cathode. Reactive d.c. magnetron sputtering in Ar/O 2 gas mixtures has been investigated with energy-resolved mass spectrometry.

Different metal targets (Mg, Ti, Zn, In, InSn, and Sn), which are of importance for transparent conductive oxide thin film deposition, have been used to study the formation of negative ions, mainly high-energetic O −, which are supposed to induce radiation damage in thin films.

Negative ions are present in magnetron sputtering if electronegative elements are involved. The majority of the negative ions impinging on transparent conductive oxide (TCO) films during growth is. Adding a plasma lens between the magnetron and substrate to (a) guide the plasma to substrate, (b) enhance ionization of gas, and (c) attempt to deflect negative ions; AZO deposited at °C had 85% transmission and resistivity in the high 10 −4 Ω cm range.

A.May 6, -- There's something in the air and while it may not be love, some say it's the next best thing -- negative ions. Negative ions are odorless, tasteless, and invisible molecules that we.